RAPID PROTOTYPING 3-D NANO-PATTERN LARGE AREA WRITER

Abstract

The project aims to establish a nanoscale three-dimensional patterning rapid prototyping capability to enable advanced nanofabrication research and development. The extension of patterning nanostructured materials in three dimensions with nanometre resolution, developed for semiconductor processing, to nano-electronics, nanophotonics, nanosensors, nanobiotechnology and fundamental studies of nanoscale phenomena in science and engineering has opened new opportunities in these areas. As these areas accelerate, there is a need to develop nanoscale patterns and structures via rapid prototyping pathways and with methods accessible to an ever-diverse researcher base without a background in nanofab..