Foundation Studies of Ion-Beam Nanotechnology

Abstract

The impact of a single fast atom with sensitive materials leaves a path of latent damage with a diameter of around 10 nm. This latent damage can be developed to create nanostructures in a novel technique called ion beam nanomachining. We propose to create a method for using single atom impacts to produce nanomachined structures with novel physical and optical properties. This will be done by use of an active substrate that functions as a detector sensitive to single ion impacts. We propose to study the fundamental principles of this method.