Nanostructured multilayers of TiN/ZrN obtained by magnetron sputtering

Abstract

In order to find an industrial application for thin films of TiN and ZrN monolayers, as well as TiN/ZrN multilayers were deposited onto silicon (100) and AISI 5160 steel substrates by r.f. (13.56 MHz) multi-target magnetron sputtering from high-purity (99.5 %) Ti and (99.5%) Zr targets in an Ar (93%) / N2 (7%) gas mixture. For their deposition, we applied a substrate bias voltage of-100 V and a target power of 350 W. The films were deposited at a pressure of 6×10-3 mbar and a temperature of 250 °C. The structure, composition, morphology, and topography were characterized by, XRD, FTIR, SEM, AFM, and optical microscopy. Mechanical properties like hardness and elastic modulus were determined b..