Fission track dating of zircon: Improved etching techniques

Abstract

A simple new technique for the etching of fission tracks in zircon has been developed which overcomes the practical difficulties of previously described techniques. The etchant is a low melting-point binary eutectic of KOH and NaOH which is used at 200-220°C. As for previous etchants the etching time is strongly dependent on the spontaneous track density. The etched tracks have very similar characteristics to those produced by the earlier 100N NaOH etchant. © 1976.