Conference Proceedings
Micro-optical structures for atom lithography studies
EC Harvey, TR Mackin, BC Dempster, RE Scholten, K Chau (ed.), S Dimitrijev (ed.)
DEVICE AND PROCESS TECHNOLOGIES FOR MEMS AND MICROELECTRONICS | SPIE-INT SOC OPTICAL ENGINEERING | Published : 1999
DOI: 10.1117/12.364493
Abstract
Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant light-fields enabling the deposition of atoms onto a substrate in a processes often referred to as atom lithography. A suitably shaped light-field gradient is used to control the path of metal atoms using the dipole force created by the interaction between atoms and the strong, near-resonant optical intensity gradient. Relatively simple patterns such as lines and dots have been created using optical standing waves while more complex light-fields might be created using computer generated optical elements (CGOE) to manipulate the laser beam. In this paper we describe the microfabrication of spira..
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