Journal article

Declining prevalence of allergic contact dermatitis caused by toslyamide/formaldehyde in nail polish

S Lee, D Maor, A Palmer, RL Nixon

Contact Dermatitis | WILEY | Published : 2018

DOI: 10.1111/cod.13020

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University of Melbourne Researchers

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Keywords

3202 Clinical Sciences
32 Biomedical and Clinical Sciences
Patch Testing
Toluenesulfonamide Formaldehyde Resin
Toslyamide/formaldehyde
Varnish
Life Sciences & Biomedicine
Science & Technology
Nail Cosmetics
Formaldehyde Resin
Dermatology
Allergic Contact Dermatitis
Allergy
Tsfr
Nail Polish