Journal article

Declining prevalence of allergic contact dermatitis caused by toslyamide/formaldehyde in nail polish

Senhong Lee, Danit Maor, Amanda Palmer, Rosemary L Nixon

Contact Dermatitis | WILEY | Published : 2018

DOI: 10.1111/cod.13020

Citation metrics

4Web of Science
3Scopus

Keywords

Nail Cosmetics
Allergy
Humans
Toluenesulfonamide Formaldehyde Resin
Allergic Contact Dermatitis
Retrospective Studies
Formaldehyde Resin
Varnish
Science & Technology
Formaldehyde
Australia
Nail Polish
Cosmetics
Toslyamide/formaldehyde
Patch Testing
Tsfr
Dermatitis, Allergic Contact
Prevalence
Dermatology
Amides
Life Sciences & Biomedicine