Journal article

Declining prevalence of allergic contact dermatitis caused by toslyamide/formaldehyde in nail polish

S Lee, D Maor, A Palmer, RL Nixon

Contact Dermatitis | WILEY | Published : 2018

DOI: 10.1111/cod.13020

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University of Melbourne Researchers

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Keywords

Toluenesulfonamide Formaldehyde Resin
Patch Testing
Life Sciences & Biomedicine
3202 Clinical Sciences
Allergy
Nail Polish
Formaldehyde Resin
Tsfr
Science & Technology
32 Biomedical and Clinical Sciences
Toslyamide/formaldehyde
Varnish
Nail Cosmetics
Allergic Contact Dermatitis
Dermatology