Journal article

Declining prevalence of allergic contact dermatitis caused by toslyamide/formaldehyde in nail polish

Senhong Lee, Danit Maor, Amanda Palmer, Rosemary L Nixon

CONTACT DERMATITIS | WILEY | Published : 2018

DOI: 10.1111/cod.13020

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Keywords

Formaldehyde Resin
Science & Technology
Toluenesulfonamide Formaldehyde Resin
Allergy
Nail Polish
Tsfr
Prevalence
Toslyamide/formaldehyde
Dermatology
Varnish
Amides
Formaldehyde
Dermatitis, Allergic Contact
Patch Testing
Retrospective Studies
Nail Cosmetics
Humans
Cosmetics
Allergic Contact Dermatitis
Australia
Life Sciences & Biomedicine