Journal article

Declining prevalence of allergic contact dermatitis caused by toslyamide/formaldehyde in nail polish

S Lee, D Maor, A Palmer, RL Nixon

Contact Dermatitis | WILEY | Published : 2018

DOI: 10.1111/cod.13020

Download PDF

University of Melbourne Researchers

Citation metrics

10Scopus
7Web of Science
14Dimensions

Keywords

Patch Testing
Varnish
Toslyamide/formaldehyde
Life Sciences & Biomedicine
Nail Cosmetics
3202 Clinical Sciences
Allergic Contact Dermatitis
Allergy
Toluenesulfonamide Formaldehyde Resin
Nail Polish
32 Biomedical and Clinical Sciences
Tsfr
Dermatology
Science & Technology
Formaldehyde Resin