X-ray enhanced sputter rates in argon cluster ion sputter-depth profiling of polymers(a))
Peter J Cumpson, Jose F Portoles, Naoko Sano, Anders J Barlow
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | A V S AMER INST PHYSICS | Published : 2013
The authors have observed for the first time that x-ray exposure of certain polymers of degrading type can greatly enhance the sputter rate of these polymers by gas cluster ion beam (GCIB) profiling. They have observed craters of similar dimensions to the x-ray spot well within the perimeter of sputter craters, indicating that x-rays can assist GCIB sputtering very significantly. This can be a major source of the loss of depth-resolution in sputter depth profiles of polymers. The authors have measured experimentally sputter craters in 14 different polymers by white-light interferometry. The results show that x-ray exposure can introduce much more topography than might previously have been ex..View full abstract
The authors are extremely grateful to Dr. Alex Shard of NPL for samples of the FMOC/Irganox 1010 sputter reference material. X-ray photoelectron spectra were obtained at the National EPSRC XPS User's Service (NEXUS) at Newcastle University, an EPSRC Mid-Range Facility. J. F. Portoles is grateful for the support of the Newcastle/Durham EPSRC Knowledge Transfer Account (KTA). The authors would especially like to thank Mike Foster of the School of Mechanical and Systems Engineering at Newcastle University for careful preparation and assembling of polymer samples for XPS analysis.