Journal article

Multilevel nanoimprint lithography with a binary mould for plasmonic colour printing

Muhammad Faris Shahin Shahidan, Jingchao Song, Timothy D James, Ann Roberts

NANOSCALE ADVANCES | ROYAL SOC CHEMISTRY | Published : 2020

Abstract

Pigment-free colouration based on plasmonic resonances has recently attracted considerable attention for potential in manufacturing and other applications. For plasmonic colour utilizing the metal-insulator-metal (MIM) configuration, the generated colour is not only dependent on the geometry and transverse dimensions, but also to the size of the vertical gap between the metal nanoparticles and the continuous metal film. The complexity of conventional fabrication methods such as electron beam lithography (EBL), however, limits the capacity to control this critical parameter. Here we demonstrate the straightforward production of plasmonic colour via UV-assisted nanoimprint lithography (NIL) wi..

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Grants

Awarded by Australian Research Council


Funding Acknowledgements

This research was supported by the Australian Research Council through LP160100054. This work was performed in part at Melbourne Center for Nanofabrication (MCN) in the Victorian Node of the Australian National Fabrication Facility (ANFF). Part of this work was also performed at Advanced Technologies Centre (ATC) in Swinburne University of Technology. We also thank Professor Paul Mulvaney and Dr Timothy J. Davis for their useful discussions.