Towards Scalable Fabrication of Plasmonic Devices via Nanoimprint Lithography (NIL)

Abstract

Advances in theoretical and computational techniques for advancing concepts in nanophotonics along with major development in nanofabrication technologies has enable the realization of nanoscale optical device with unprecedented ability to control light such as plasmonic metasurface. Fabrication of plasmonic devices, however, has long been relying on conventional lithography technique such as electron beam lithography (EBL), focused ion beam (FIB) milling and photolithography (PL). While these lithography techniques have enable construction of sub-wavelengths nanostructures, their reliance on the interaction between charged particles or light beam with polymer resist during pattern writing pr..