Journal article

Modulating the pattern quality of micropatterned multilayer films prepared by layer-by-layer self-assembly

J Cho, H Jang, B Yeom, H Kim, R Kim, S Kim, K Char, F Caruso

LANGMUIR | AMER CHEMICAL SOC | Published : 2006

Abstract

Patterned multilayer films composed of poly(allylamine hydrochloride) (PAH) and poly(sodium 4-styrenesulfonate) (PSS) were prepared using dip and spin self-assembly (SA) methods. A silicon substrate was patterned with a photoresist thin film using conventional photolithography, and PAH/PSS multilayers were then deposited onto the substrate surface using dip or spin SA. For spin SA, the photoresist on the substrate was retained, despite the high centrifugal forces involved in depositing the polyelectrolytes (PEs). The patterned multilayer films were formed by immersing the PE-coated substrates in acetone for 10 min. The effect of ionic strength on the pattern quality in dip and spin multilaye..

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University of Melbourne Researchers