Conference Proceedings
Development of a single ion detection system for the implantation of donors with nanoscale precision
T Hopf, C Yang, DN Jamieson, G Tamanyan, SE Andresen, E Gauja, AS Dzurak, RG Clark
Proceedings of the 2006 International Conference on Nanoscience and Nanotechnology Iconn | Published : 2006
Abstract
We have developed a technique which enables the implantation and detection of single low-energy (<15 kev) ions in a silicon substrate with nanoscale precision, and with a detection efficiency approaching 100%. The process is based on the collection of electron-hole pairs generated in the substrate by the ion impacts, and is currently being utilized for the construction of prototype quantum computer devices in the solid state. © 2006 IEEE.