Optical tomographic reconstruction of ion beam induced refractive index changes in silica

Abstract

Refractive index changes induced by ion beam implantation can be used to produce photonic devices such as waveguides. Here, we relate the measured three-dimensional changes in refractive index produced by ion beam implantation to modeling of the implantation process. We use a quantitative phase microscopic method in conjunction with a tomographic reconstruction process to determine the change in the refractive index distribution within a silica optical fiber that has been selectively implanted with 2.4 MeV H+ ions. The index profile is compared with numerical simulations of the ion vacancy and ionization using the stopping range of ions in matter program. © 2007 American Institute of Physics..