Reactive ion etching of waveguide structures in diamond
Mark P Hiscocks, Christopher J Kaalund, Francois Ladouceur, Shane T Huntington, Brant C Gibson, Steven Trpkovski, David Simpson, Eric Ampem-Lassen, Steven Prawer, James E Butlerc
DIAMOND AND RELATED MATERIALS | ELSEVIER SCIENCE SA | Published : 2008
Waveguide structures were fabricated in both nanocrystalline CVD diamond (NCD) and HPHT type 1b single crystal diamond using photolithography and reactive ion etching. The combination of these techniques allows the patterning of many long photonic structures simultaneously, making it easily scalable. Emphasis has been placed on reducing sidewall roughness to prevent loss due to scattering. In single crystal diamond a peak-to-peak roughness of approximately 10 nm (estimated from SEM images) was achieved for the majority of the structure sidewall. © 2008 Elsevier B.V.
The authors would like to thank the NRL for providing the NCD samples and Wilson Pok for the AFM. This project is proudly supported by the International Science Linkages programme established under the Australian Government's innovation statement Backing Australia's Ability. The authors wish to also acknowledge the Victorian Government's Science, Technology & Innovation Infrastructure Grants Program for the funding of this project.