Journal article
Diamond waveguides fabricated by reactive ion etching
Mark P Hiscocks, Kumaravelu Ganesan, Brant C Gibson, Shane T Huntington, Francois Ladouceur, Steven Prawer
OPTICS EXPRESS | OPTICAL SOC AMER | Published : 2008
DOI: 10.1364/OE.16.019512
Abstract
We demonstrate for the first time the feasibility of all-diamond integrated optic devices over large areas using a combination of photolithography, reactive ion etching (RIE) and focused ion beam (FIB) techniques. We confirm the viability of this scalable process by demonstrating guidance in a two-moded ridge waveguide in type 1b single crystal diamond. This opens the door to the fabrication of a diamond-based optical chip integrating functional elements such as X-crossings, Y-junctions, evanescent couplers, Bragg reflectors/couplers and various interferometers.
Grants
Funding Acknowledgements
The authors thank Photon Design support for their assistance with FIMMWAVE simulations. This project is proudly supported by the International Science Linkages programme established under the Australian Government's innovation statement Backing Australia's Ability. The authors wish to also acknowledge the Victorian Government's Science, Technology & Innovation Infrastructure Grants Program for the funding of this project.