Journal article
Acid-sensitive semiperfluoroalkyl resorcinarene: An imaging material for organic electronics
JK Lee, M Chatzichristidi, AA Zakhidov, PG Taylor, JA DeFranco, SH Ha, HF Hon, AB Holmes, GG Malliaras, CK Ober
Journal of the American Chemical Society | Published : 2008
DOI: 10.1021/ja803493m
Abstract
An acid-sensitive semiperfluoroalkyl resorcinarene was synthesized, and its lithographic properties were evaluated. Its solubility in segregated hydrofluoroether solvents enables the patterning of delicate organic electronic materials. Copyright © 2008 American Chemical Society.
Grants
Awarded by Australian Research Council/National Science Foundation
Funding Acknowledgements
This research was accomplished with the,support of the Australian Research Council/National Science Foundation (Materials World Network DMR-0602821). We also thank Mr.. Erik Olson at 3M for valuable discussions oil Novec Engineered Fluids and the Cornell NanoScale Facility for use Of their equipment.