Characterization of the ZnO thin film prepared by single source chemical vapor deposition under low vacuum condition

Abstract

A novel technique is developed for growing high quality ZnO thin films by means of single source chemical vapor deposition (SS CVD) under low vacuum conditions with the precursor of zinc carbamate Zn4O(CO 2Net2)6. SEM, AFM and XRD studies show that the resultant thin films have high density, smooth surface, uniform polycrystalline structure and excellent c-axis orientation. XPS investigation indicates that the ZnO films are free of decomposed precursor residues in the bulk. Careful quantitative XPS analysis reveals that the ZnO films are stoichiometric with O/Zn atomic ratio very close to that of ZnO single crystal.