Journal article
Acid-diffusion behaviour in organic thin films and its effect on patterning
JK Lee, M Chatzichristidi, AA Zakhidov, HS Hwang, EL Schwartz, J Sha, PG Taylor, HH Fong, JA Defranco, E Murotani, WWH Wong, GG Malliaras, CK Ober
Journal of Materials Chemistry | ROYAL SOC CHEMISTRY | Published : 2009
DOI: 10.1039/b817286b
Abstract
Acid and its formation and placement is one of the most important aspects in the chemically amplified photolithographic process. The choice of photoacid generator (PAG) in the photolithographic patterning of acidic substrates, such as PEDOT:PSS, has consequences for the resolution and overall quality of the patterned image. In this study, an acid exchange and diffusion mechanism is proposed for the undesired decomposition of the unexposed photoresist layer containing ionic PAGs. The use of non-ionic PAGs has been shown to be a solution to this decomposition problem. In addition, the acidic nature of the PEDOT:PSS substrate is employed to produce patterned images of a cross-linkable light-emi..
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Awarded by National Science Foundation
Awarded by Australian Government Department of Innovation, Industry, Science and Research
Funding Acknowledgements
This research was accomplished with the support of the National Science Foundation (Materials World Network DMR-0602821, IGERT program) and the New York State Foundation for Science, Technology and Innovation (NYSTAR). WWHW would also like to thank the Australian Research Council, the Victorian Government Department of Primary Industries, the Australian Government Department of Innovation, Industry, Science and Research (ETIS, CG10059) and DAAD/Go8 exchange scheme for generous financial support. We also thank the Cornell NanoScale Facility for use of their equipment.