Conference Proceedings
Nickel germanide formation via solid phase epitaxial regrowth of amorphous germanium
BC Johnson, M Leong, S Kandasamy, A Holland, JC McCallum
Conference on Optoelectronic and Microelectronic Materials and Devices Proceedings COMMAD | IEEE | Published : 2010
Abstract
The effect of Ni on the kinetics of solid phase epitaxial re-crystallization of amorphous germanium films is investigated with Raman spectroscopy. Both Ni implantation and deposition are employed. © 2010 IEEE.