Conference Proceedings
Deep-level transient spectroscopy study of channelled boron implantation in silicon
L Deam, BC Johnson, JC McCallum
Conference on Optoelectronic and Microelectronic Materials and Devices Proceedings | IEEE | Published : 2010
Grants
Funding Acknowledgements
The Department of Electronic Materials Engineering at the Australian National University is acknowledged for their support by providing access to ion implanting facilities. This work is supported by a grant from the Australian Research Council.