Conference Proceedings

Deep-level transient spectroscopy study of channelled boron implantation in silicon

L Deam, BC Johnson, JC McCallum

Conference on Optoelectronic and Microelectronic Materials and Devices Proceedings | IEEE | Published : 2010


Funding Acknowledgements

The Department of Electronic Materials Engineering at the Australian National University is acknowledged for their support by providing access to ion implanting facilities. This work is supported by a grant from the Australian Research Council.