Journal article

Energy level evolution of air and oxygen exposed molybdenum trioxide films

undefined Irfan, Huanjun Ding, Yongli Gao, Cephas Small, Do Young Kim, Jegadesan Subbiah, Franky So

APPLIED PHYSICS LETTERS | AMER INST PHYSICS | Published : 2010

Abstract

The evolution of electronic energy levels of controlled air and oxygen exposed molybdenum trioxide (MoO3) films has been investigated with ultraviolet photoemission spectroscopy, inverse photoemission spectroscopy, and x-ray photoemission spectroscopy. We found that while most of the electronic levels of as deposited MoO3 films remained largely intact, the reduction in the work function (WF) was substantial. The gradual surface WF change from 6.8 to 5.3 eV was observed for air exposed film, while oxygen exposed film the surface WF saturated at ∼5.7 eV. Two distinct stages of exposure are observed, the first dominated by oxygen adsorption for 1013 L. © 2010 American Institute of Physics.

University of Melbourne Researchers

Grants

Awarded by National Science Foundation


Funding Acknowledgements

The authors at UR would like to acknowledge the support of the National Science Foundation under Grant No. DMR-1006098. The authors at UF would like to acknowledge the support of the Florida Energy Systems Consortium.