Energy level evolution of air and oxygen exposed molybdenum trioxide films
undefined Irfan, Huanjun Ding, Yongli Gao, Cephas Small, Do Young Kim, Jegadesan Subbiah, Franky So
APPLIED PHYSICS LETTERS | AMER INST PHYSICS | Published : 2010
The evolution of electronic energy levels of controlled air and oxygen exposed molybdenum trioxide (MoO3) films has been investigated with ultraviolet photoemission spectroscopy, inverse photoemission spectroscopy, and x-ray photoemission spectroscopy. We found that while most of the electronic levels of as deposited MoO3 films remained largely intact, the reduction in the work function (WF) was substantial. The gradual surface WF change from 6.8 to 5.3 eV was observed for air exposed film, while oxygen exposed film the surface WF saturated at ∼5.7 eV. Two distinct stages of exposure are observed, the first dominated by oxygen adsorption for 1013 L. © 2010 American Institute of Physics.
Awarded by National Science Foundation
The authors at UR would like to acknowledge the support of the National Science Foundation under Grant No. DMR-1006098. The authors at UF would like to acknowledge the support of the Florida Energy Systems Consortium.