Dopant effects on solid phase epitaxy in silicon and germanium
BC Johnson, T Ohshima, JC McCallum
Journal of Applied Physics | AMER INST PHYSICS | Published : 2012
Awarded by Japan Society for the Promotion of Science (JSPS)
Awarded by Grants-in-Aid for Scientific Research
B.C.J. would like to thank the Japan Society for the Promotion of Science (JSPS) for financial support (Grant-in-aid for Scientific Research, 22.00802). The Department of Electronic Materials Engineering at the Australian National University is acknowledged for providing access to sample preparation facilities. This work was funded by a grant from the Australian Research Council.