Journal article

Pulsed-radio frequency plasma enhanced chemical vapour deposition of low temperature silicon nitride for thin film transistors

Arman Ahnood, Yuji Suzuki, Arun Madan, Arokia Nathan

Thin Solid Films | ELSEVIER SCIENCE SA | Published : 2012

DOI: 10.1016/j.tsf.2012.03.010

University of Melbourne Researchers

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Keywords

Materials Science, Coatings & Films
Pulsed-Rf Plasma-Enhanced Chemical Vapour Deposition
Physical Sciences
Surface Smoothening
Physics, Condensed Matter
Height-To-Height Correlation Function
Technology
Room-Temperature
Tfts
Growth Mechanism
Hydrogenated Amorphous-Silicon
Materials Science, Multidisciplinary
Thin Film Transistors
Pecvd
Growth
Surface Diffusion Length
Microstructure
Materials Science
Science & Technology
Physics
Silicon Nitride
Physics, Applied