Journal article

Pulsed-radio frequency plasma enhanced chemical vapour deposition of low temperature silicon nitride for thin film transistors

Arman Ahnood, Yuji Suzuki, Arun Madan, Arokia Nathan

Thin Solid Films | ELSEVIER SCIENCE SA | Published : 2012

DOI: 10.1016/j.tsf.2012.03.010

University of Melbourne Researchers

Citation metrics

7Web of Science
8Scopus
8Dimensions

Keywords

Surface Smoothening
Science & Technology
Tfts
Technology
Hydrogenated Amorphous-Silicon
Thin Film Transistors
Silicon Nitride
Surface Diffusion Length
Height-To-Height Correlation Function
Physical Sciences
Pulsed-Rf Plasma-Enhanced Chemical Vapour Deposition
Pecvd
Physics, Condensed Matter
Physics, Applied
Growth
Materials Science, Coatings & Films
Room-Temperature
Materials Science
Microstructure
Physics
Growth Mechanism
Materials Science, Multidisciplinary