Journal article
International guidelines for the in vivo assessment of skin properties in non-clinical settings: Part 1. pH
AB Stefaniak, JD Plessis, SM John, F Eloff, T Agner, TC Chou, R Nixon, MFC Steiner, I Kudla, D Linn Holness
Skin Research and Technology | WILEY | Published : 2013
DOI: 10.1111/srt.12016
Abstract
Background: Skin surface pH is known to influence the dissolution and partitioning of chemicals and may influence exposures that lead to skin diseases. Non-clinical environments (e.g. workplaces) are highly variable, thereby presenting unique measurement challenges that are not typically encountered in clinical settings. Hence, guidelines are needed for consistent measurement of skin surface pH in environments that are difficult to control. Methods: An expert workshop was convened at the 5th International Conference on Occupational and Environmental Exposure of Skin to Chemicals to review available data on factors that could influence the determination of skin surface pH in non-clinical sett..
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Funding Acknowledgements
The authors thank S. Dotson and G. Day at NIOSH for critical review of this manuscript. Mention of a specific product or company does not constitute endorsement by the Centers for Disease Control and Prevention. The findings and conclusions in this report are those of the authors and do not necessarily represent the views of NIOSH. Financial support for the workshop on Workplace Measurement of Skin Barrier and Physiology was provided by the NIOSH National Occupational Research Agenda Immune and Dermal cross-sector. T. C. C. was supported by grants CMU98-S-28 and NSC 97-2314-B-039-022-MY3. Participants of the workshop on Workplace Measurement of Skin Barrier and Physiology which was held under the auspices of the 5th International Conference on Occupational and Environmental Exposure of Skin to Chemicals (OEESC): T. Agner (Denmark), V. Arrandale (Canada), D. Burke (Canada), T. C. Chou (Taiwan, R.O.C.), L. Dilworth (Canada), F. C. Eloff (South Africa), H. Harari (United States), T. Hahn (Germany), L. Holness (Canada), S. M. John (Germany), J. Kim (Canada), I. Kudla (Canada), R. Nixon (Australia), J. L. du Plessis (South Africa), A. B. Stefaniak (United States), G. Wozniak (Canada)