Journal article

Repetitive Hole-Mask Colloidal Lithography for the Fabrication of Large-Area Low-Cost Plasmonic Multishape Single-Layer Metasurfaces

Jun Zhao, Sarah Jaber, Paul Mulvaney, Paul V Braun, Harald Giessen

ADVANCED OPTICAL MATERIALS | WILEY-V C H VERLAG GMBH | Published : 2015

Abstract

A novel fabrication method, multiple repetitions of hole-mask colloidal nanolithography, is introduced to create single-layer metasurfaces with complex, multishape plasmonic nanostructures that exhibit desired optical functionalities. Large-area and low-cost fabrication of different samples with independently tunable resonances are demonstrated. These single-layer metasurfaces may find applications as multiline surface-enhanced infrared absorption and broadband substrates. This fabrication method is particularly suited for the creation of large-area, single-layer C3-rotationally symmetric, 3D chiral metasurfaces, and this approach circumvents common problems with elliptical birefringence and..

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University of Melbourne Researchers