Conference Proceedings
Nitrogen ion implantation into glassy carbon and diamond.
D Barbara, S Prawer, SP Withrow, JM Williams, DN Jamieson, A Saint, SP Dooley, JS Williams (ed.), RG Elliman (ed.), MC Ridgway (ed.)
ION BEAM MODIFICATION OF MATERIALS | ELSEVIER SCIENCE PUBL B V | Published : 1996
Abstract
High dose N ion implantations into glassy carbon (GC) and diamond were performed at energies of 160 and 300 keV respectively. Target temperatures of the GC and diamond substrates were −100° C and room temperature respectively. Maximum N concentrations of 30 and 17 at.% were achieved for the GC and diamond respectively. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) revealed unusual surface modifications for both substrates.