Conference Proceedings

Low temperature of formation of nickel germanide by reaction of nickel and crystalline germanium

F Algahtani, PW Leech, GK Reeves, AS Holland, M Blackford, G Thorogood, JC McCallum, BC Johnson

Materials Research Society Symposium Proceedings | Published : 2014


The formation of nickel germanide has been examined over a range of low temperatures (200-400 °C) in an attempt to minimize the thermal budget for the process. Cross-sectional Transmission Electron Microscopy (TEM) was used to determine the texture of the germanide layer and the morphology and constituent composition of the Ge/NiGe interface. The onset and completion of reaction between Ni and Ge were identified by means of a heated stage in combination with in-situ x-ray diffraction (XRD) measurements. The stages of reaction were also monitored using measurements of sheet resistance of the germanides by the Van der Pauw technique. The results have shown that the minimum temperature for the ..

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